Tantalum Nitride TaN Powder CAS 12033-62-4

Overview of Tantalum Nitride TaN Powder        

Tantalum nitride (TaN) powder is an inorganic compound composed of tantalum and nitrogen elements with excellent physical and chemical properties. It appears as a black or dark gray powder with high hardness, high melting point, and high chemical stability. These characteristics make TaN powder have broad application value in multiple fields.

In the electronics industry, TaN powder is commonly used to manufacture high-performance films and coatings to improve the conductivity, heat resistance, and corrosion resistance of electronic devices. In addition, TaN powder can also be used as a catalyst, an additive for ceramic materials, and a reinforcing agent for hard alloys. Due to its great physical and chemical features, TaN powder plays a crucial role in modern technology and industrial fields. With the continuous development of science and technology, the application prospects of TaN powder will be even broader.

(Tantalum Nitride TaN Powder CAS 12033-62-4)

Features of Tantalum Nitride TaN Powder        

High hardness: TaN powder has extremely high hardness, making it an ideal wear-resistant material.
High melting point: Its high melting point enables TaN powder to remain stable in high-temperature environments, making it suitable for high-temperature applications.
Good chemical stability: TaN powder has excellent resistance to various chemical substances and is not easily corroded.
Excellent conductivity: TaN powder has excellent conductivity and is suitable for the electronics and semiconductor industries.
High mechanical strength: Its high strength and excellent mechanical features make it an ideal choice for manufacturing high-performance composite materials.
Easy to process: TaN powder is easy to produce thin films, coatings, or composite materials through different processing techniques.

Parameter table of Tantalum Nitride TaN Powder

Tantalum Nitride Properties
Other Names	Tantalum mononitride, azanylidynetantalum, nitridotantalum, Nitrilotalanlum
CAS No.	12033-62-4
Compound Formula	TaN
Molecular Weight	194.95
Appearance	Black Powder
Melting Point	3090 ℃
Boiling Point	N/A
Density	13.4 g/cm3
Solubility in H2O	N/A
Exact Mass	194.95458 g/mol
Tantalum Nitride Health & Safety Information
Signal Word	N/A
Hazard Statements	N/A
Hazard Codes	NDS 69,209 (1993)
Risk Codes	stable
Safety Statements	3/2-
Transport Information	7452.8 10

Application of Tantalum Nitride TaN Powder                 

Electronic industry: used to manufacture electronic components such as capacitors, resistors, and integrated circuits to improve their performance and stability.
Cutting tools: TaN powder is used to manufacture cutting tools, drills, and abrasives.
Coating material: Coating TaN film on the metal surface can improve the wear resistance, corrosion resistance, and hardness of the metal.
Aerospace: TaN powder is widely used in the aerospace field due to its high temperature stability and good mechanical properties.
Semiconductor industry: used as a diffusion barrier layer or electrode material in the manufacturing of integrated circuits and semiconductor devices.
Catalyst: TaN powder can also be used as a catalyst for certain chemical reactions, promoting the progress of chemical reactions.

Application of Tantalum Nitride TaN Powder

Application of Tantalum Nitride TaN Powder

Production Method of Tantalum Nitride TaN Powder

Chemical Vapor Deposition (CVD)

Tantalum – containing precursors like tantalum pentachloride (TaCl_5) and nitrogen – bearing gases such as ammonia (NH3) are introduced into a reaction chamber. At high temperatures, typically 800 – 1200°C, a chemical reaction occurs. The (TaCl5) decomposes, and tantalum atoms react with nitrogen from (NH3) to form TaN powder. The reaction can be represented as \(TaCl5 + 3NH3→TaN + 5HCl + N2). This method allows for precise control over the powder’s quality and particle characteristics.

Physical Vapor Deposition (PVD) – Magnetron Sputtering

A tantalum target is placed in a vacuum chamber. A magnetic field is applied to ionize the sputtering gas (usually argon). When nitrogen gas is introduced, argon ions bombard the tantalum target, ejecting tantalum atoms. These atoms react with nitrogen in the gas phase to form TaN, which then deposits on the substrate or condenses to form powder. Adjusting parameters like sputtering power and gas flow rates can control the powder’s properties.

Carbothermal – Nitridation Method

Tantalum pentoxide (Ta2O5) is mixed with carbon powder. The mixture is heated in a nitrogen atmosphere at 1400 – 1700°C. Carbon reduces the (Ta2O5), and the resulting tantalum species react with nitrogen to form TaN powder. The main reaction is (Ta2O5 + 7C + 2N2 →2TaN + 5CO + 2C). This process can produce TaN powder with relatively high purity.

Company Profile

RBOSCHCO is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.

The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.

If you are looking for high-quality Tantalum Nitride TaN Powder , please feel free to contact us or click on the needed products to send an inquiry. 

Storage Condition of Tantalum Nitride TaN Powder

Tan powder must be saved in impermeable containers to avoid direct exposure to oxygen and dampness. Oxygen can trigger the oxidation of the powder, changing its chemical makeup and possibly deteriorating its efficiency in applications such as electronic devices or coverings. Wetness can likewise start undesirable responses, particularly if the powder has some level of sensitivity to water.
The storage space atmosphere ought to be completely dry, with a family member moisture preserved listed below 40%. An exceptional storage space temperature level, around 20 – 25 ° C, is suitable. Severe temperature levels can affect the powder’s framework and security.

Payment Term

L/C, T/T, Western Union, Paypal, Credit Card etc.

 

Shipment Term

By sea, by air, by express, as customers request.

5 FAQs of Tantalum Nitride TaN Powder

Q1

What is the significance of high hardness in Tantalum Nitride (TaN) powder?

Answer: The high hardness of Tantalum Nitride (TaN) powder is significant as it confers excellent wear resistance and durability to materials incorporating it. This hardness makes TaN powder ideal for use in abrasive applications, cutting tools, and wear-resistant coatings, where durability and longevity are crucial.

Q2

How does the high melting point of Tantalum Nitride (TaN) powder contribute to its industrial applications?

Answer: The high melting point of Tantalum Nitride (TaN) powder allows it to maintain stability and performance even in extreme high-temperature environments. This feature is crucial in industrial applications where materials are exposed to high temperatures, such as in the aerospace, automotive, and electronics industries. TaN powder’s thermal stability ensures reliable performance under such conditions.

Q3

In what ways does Tantalum Nitride (TaN) powder enhance the performance of electronic devices?

Answer: Tantalum Nitride (TaN) powder enhances the performance of electronic devices by providing excellent electrical conductivity, thermal stability, and corrosion resistance. It can be used as a thin film or coating to improve the efficiency and durability of electronic components, such as capacitors, resistors, and integrated circuits. TaN powder’s high conductivity allows for efficient charge transport, while its thermal stability ensures reliable operation even under high-temperature conditions.

Q4

How does the chemical stability of Tantalum Nitride (TaN) powder affect its use in coatings?

Answer: The chemical stability of Tantalum Nitride (TaN) powder is crucial for its use in coatings. Its resistance to corrosion and chemical attack means that TaN coatings can protect the underlying material from degradation caused by exposure to harsh environments or chemicals. This stability ensures that the coating maintains its properties and functionality for extended periods, protecting the substrate and enhancing the overall durability of the coated product.

Q5

Why is Tantalum Nitride (TaN) powder a preferred material for high-performance composites?

Answer: Tantalum Nitride (TaN) powder is a preferred material for high-performance composites due to its combination of excellent mechanical properties, high hardness, and good thermal stability. Its high strength and stiffness contribute to the composite’s overall mechanical performance, making it suitable for demanding applications. Furthermore, TaN powder’s resistance to thermal degradation ensures that the composite maintains its structural integrity even under high-temperature conditions, enhancing its reliability and durability.

What is the relevance of high firmness in Tantalum Nitride (TaN) powder?

Response: The high solidity of Tantalum Nitride (TaN) powder is considerable as it provides outstanding wear resistance and toughness to products integrating it. This firmness makes TaN powder perfect for usage in rough applications, reducing devices, and wear-resistant coverings, where toughness and durability are important.

Q2

Just how does the high melting point of Tantalum Nitride (TaN) powder add to its commercial applications?

Solution: The high melting point of Tantalum Nitride (TaN) powder enables it to preserve security and efficiency also in severe high-temperature atmospheres. This attribute is essential in commercial applications where products are revealed to heats, such as in the aerospace, auto, and electronic devices sectors. TaN powder’s thermal security guarantees reputable efficiency under such problems.

Q3

In what methods does Tantalum Nitride (TaN) powder improve the efficiency of digital tools?

Solution: Tantalum Nitride (TaN) powder improves the efficiency of digital gadgets by giving superb electric conductivity, thermal security, and deterioration resistance. It can be utilized as a slim movie or finish to boost the performance and sturdiness of digital elements, such as capacitors, resistors, and incorporated circuits. TaN powder’s high conductivity enables effective fee transportation, while its thermal security makes sure trusted procedure also under high-temperature problems.

Q4

Just how does the chemical security of Tantalum Nitride (TaN) powder influence its usage in finishings?

Response: The chemical security of Tantalum Nitride (TaN) powder is important for its usage in finishings. Its resistance to deterioration and chemical assault suggests that TaN layers can shield the underlying product from destruction brought on by direct exposure to extreme settings or chemicals. This security guarantees that the finish preserves its buildings and capability for extensive durations, securing the substratum and boosting the general longevity of the layered item.

Q5

Why is Tantalum Nitride (TaN) powder a recommended product for high-performance compounds?

Response: Tantalum Nitride (TaN) powder is a recommended product for high-performance compounds because of its mix of exceptional mechanical residential properties, high solidity, and great thermal security. Its high toughness and rigidity add to the compound’s general mechanical efficiency, making it ideal for requiring applications. In addition, TaN powder’s resistance to thermal destruction makes certain that the composite preserves its architectural stability also under high-temperature problems, boosting its dependability and toughness.