Titanium Sputtering Target/ Pure Titanium Target /alloy Titanium Target for Vacuum Coating

Overview of High Purity Titanium Sputtering Target

The high-pureness titanium sputtering target is a vital element in modern-day vacuum cleaner deposition procedures. It acts as the resource product for transferring slim movies of titanium onto numerous substratums, such as semiconductors, glass, and porcelains. The target is made from titanium steel that is fine-tuned to remarkable pureness degrees, guaranteeing regular and top notch deposition outcomes. Its usage prevails in the electronic devices, optics, and finish sectors, where specific control over product make-up and microstructure is vital.

(Metal Alloy High Purity Titanium Sputtering Target)

Characteristics of High Purity Titanium Sputtering Target

High Purity: The titanium sputtering target boasts an extremely high purity level, typically exceeding 99.99%, eliminating impurities that can compromise deposition quality.

High Pureness: The titanium sputtering target flaunts an incredibly high pureness degree, typically surpassing 99.99%, removing contaminations that can endanger deposition top quality.

Exceptional Thickness and Homogeneity: Its thick and consistent framework ensures constant sputtering prices and consistent movie deposition.

High Thermal Conductivity: This enables efficient warmth dissipation throughout sputtering, protecting against target damages and boosting procedure security.

Sturdy and Dependable: The target product shows exceptional resistance to disintegration, keeping a steady sputtering surface area for prolonged durations.

Easy to Refine: It can be conveniently reduced and formed to fit different sputtering systems, improving procedure versatility.

Parameter table of High Purity Titanium Sputtering Target

Metal Alloy High Purity Titanium Sputtering Target Properties
Other Names	Titanium sputtering target
CAS No.	N/A
Compound Formula	Ti
Molecular Weight	N/A
Appearance	N/A
Melting Point	N/A
Solubility in water	N/A
Density	N/A
Purity	99.6%
Size	customized
Boling point	N/A
Specific Heat	N/A
Thermal Conductivity	N/A
Thermal Expansion	N/A
Young’s Modulus	N/A
Exact Mass	N/A
Monoisotopic Mass	N/A
Metal Alloy High Purity Titanium Sputtering Target Health & Safety Information
Safety Warning	N/A
Hazard Statements	N/A
Flashing point	N/A
Hazard Codes	N/A
Risk Codes	N/A
Safety Statements	N/A
RTECS Number	N/A
Transport Information	N/A
WGK Germany	N/A

Application of High Purity Titanium Sputtering Target

Electronics Industry: High purity titanium films are deposited on semiconductors and electronic components to enhance their electrical properties and durability.

 Electronics Industry

Optical Coatings: Titanium films are used as optical coatings for glass and mirrors, improving reflectivity and durability.

 Optical Coatings

Decorative Coatings: Titanium sputtered coatings are employed in the automotive and jewelry industries for their attractive appearance and corrosion resistance.

 Decorative Coatings

Solar Energy: Titanium films are deposited on solar cells to enhance their light absorption and conversion efficiency.

 

Solar Energy

Medical Applications: Titanium coatings are used in medical implants and surgical instruments due to their biocompatibility and corrosion resistance.

 

Medical Applications

 

Production Method of High Purity Titanium Sputtering Target

1. Raw Material Selection: High-purity copper materials, along with specific alloying elements in precise proportions, are selected to ensure the desired density and properties.
2. Melting and Refining: The raw materials are melted in a high-temperature furnace under an inert gas atmosphere to prevent oxidation. Refining agents may be added to remove impurities and improve purity.
3. Casting: The molten metal is poured into a preheated mold and cooled under controlled conditions to form a copper plate ingot.
4. Hot Rolling: The ingot is heated and passed through rolling mills to reduce thickness and improve mechanical properties.
5. Cold Rolling: Followed by cold rolling at room temperature for better surface finish and dimensional accuracy.
6. Polishing: Mechanical and chemical polishing methods are used to achieve a high-purity polished surface.

Company Profile

RBOSCHCO is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.

The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.

If you are looking for high-quality High Purity Titanium Sputtering Target, please feel free to contact us or click on the needed products to send an inquiry.

Storage Condition of High Purity Titanium Sputtering Target

Temperature: The ideal storage temperature is between 15°C and 25°C. Extreme temperatures can cause thermal expansion or contraction, which may lead to internal stress in the copper plate and affect its mechanical properties and dimensional stability.

Humidity: The relative humidity should be kept below 60%, preferably around 40% – 50%, because high humidity will cause condensation on the surface of the copper plate, promoting the formation of copper oxide and other corrosive substances, thereby reducing its purity and surface quality.

Storage Rack: The copper plate should be placed on a clean, flat and dry storage rack. The rack should be made of materials that will not cause corrosion or contamination to the copper plate, such as stainless steel or plastic.

Isolation: It should be isolated from other metals that may cause galvanic corrosion and from corrosive substances such as acids, alkalis and salts. These substances can react with the copper plate and cause damage.

Packaging: The copper plate can be wrapped in anti-rust paper, plastic film or other protective materials to cut down direct contact with air and moisture. Vacuum packaging can also be considered for long-term storage to isolate it further from the outside environment.

Handling: When handling the copper plate, clean gloves should be worn to avoid leaving fingerprints and sweat on the surface, which can cause corrosion. Tools used for handling should also be clean and free of sharp edges to prevent scratching the surface of the copper plate.

Inspection: Regularly inspect the copper plate for any signs of corrosion, scratches or other damage. If any problems are found, appropriate measures should be taken in a timely manner, such as cleaning, rust removal or re-protection.

Payment Term

L/C, T/T, Western Union, Paypal, Credit Card etc.

 

Shipment Term

By sea, by air, by express, as customers request.

5 FAQs of High Purity Titanium Sputtering Target

Q1:

What is the significance of high purity in titanium sputtering targets?

Re: The value of high pureness in titanium sputtering targets hinges on the requirement for exact control over the structure of the transferred movie. Contaminations change the film’s physical and chemical properties, compromising its performance and reliability. High-purity titanium targets ensure consistent and predictable deposition results, crucial for many applications.

Q2:

How does the density of the sputtering target affect the deposition process?

Re: The thickness of the sputtering target straight influences the deposition procedure. A thick target product causes a much more consistent and regular sputtering price, causing a smoother and extra consistent movie deposition. This is vital for accomplishing premium layers with exceptional optical and electric residential properties.

Q3:

What are the challenges associated with sputtering high purity titanium?

Re: Sputtering high pureness titanium can be testing as a result of its high melting point and sensitivity with various other products. Specific control over sputtering problems, such as temperature level, stress, and sputtering power, is necessary to protect against target damages and make certain ideal deposition high quality. Furthermore, managing and refining high pureness titanium call for unique like prevent contamination.

Q4:

How does the sputtering target material affect the properties of the deposited film?

Re: The sputtering target material has a direct impact on the properties of the deposited film. The purity, density, and microstructure of the target determine the composition, structure, and performance of the resulting film. Therefore, selecting the appropriate target material is crucial for achieving desired film properties.

Q5:

What are the future trends in titanium sputtering target technology?

Re: Future trends in titanium sputtering target technology are likely to focus on improving purity degrees, boosting deposition prices and harmony, and creating brand-new sputtering procedures that are more energy-efficient and eco-friendly. Furthermore, there might be an increasing need for personalized targets to satisfy the details requirements of numerous applications.