Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets

(Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets)

Overview of Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets      

Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets are precision-manufactured components designed for use in various scientific and industrial applications. These targets are crafted from tungsten, a metal renowned for its high density of 19.15 grams per cubic centimeter, excellent thermal conductivity, and remarkable resistance to corrosion. The fine surface finish of these targets ensures smooth and consistent performance, crucial for accurate and reliable results. Tungsten targets are widely employed in fields such as sputtering, vacuum deposition, and X-ray generation, where their high density and durability are essential. The combination of tungsten's inherent properties and the fine surface finish of these targets makes them an ideal choice for demanding applications that require precision and durability.

Features of Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets      

High density characteristics: The target material has a density of 19.15g/cm ³ Its high density makes it excellent in applications that require high-quality deposition, such as sputtering coating and vacuum deposition technology.

Excellent thermal stability: Due to the high melting point of tungsten, this target material can maintain stable performance in high-temperature environments and is not easily deformed or melted.

Strong corrosion resistance: Tungsten has excellent resistance to various chemical substances, so this target material can maintain its performance in corrosive environments.

Fine surface treatment: The surface of the target material is finely treated to ensure a smooth and defect free surface, which helps to achieve a uniform deposition effect.

High mechanical strength: Tungsten alloys have high mechanical strength, allowing the target material to maintain structural integrity during long-term use.

Excellent conductivity and thermal conductivity: This target material has excellent conductivity and thermal conductivity, which is conducive to achieving efficient energy transfer during electron beam evaporation or sputtering.

Application of Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets             

Sputtering coating: In the manufacturing processes of semiconductors, displays, and solar cells, this target material is used for sputtering coating to form high-quality functional thin films.

Application of Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets

Vacuum deposition: Using this target material for physical vapor deposition in a vacuum environment to prepare various metal, alloy, or compound thin films.

X-ray tube: As an anode target material in X-ray tubes, due to its high density and good thermal stability, it can produce stable and high-quality X-rays.

Research experiments: In the fields of materials science, physics, and chemistry, this type of target material is commonly used to prepare new materials or study material properties.

Other industrial applications: It can also be used in processes such as electron beam evaporation and ion beam sputtering to prepare various thin film materials.

Medical devices: In medical device manufacturing, this target material can be used to prepare coatings with specific functions, such as antibacterial coatings or biocompatible coatings.

Application of Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets

Company Profile

NANOTRUN(www.rboschco.com) is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality chemicals and nanomaterials, including boride powder, nitride powder, graphite powder, sulfide powder, 3D printing powder, etc.

The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.

If you are looking for high-quality Metal Alloy Fine Surface 19.15g/cm3 Tungsten Targets, please feel free to contact us or click on the needed products to send an inquiry. 

Payment Term

L/C, T/T, Western Union, Paypal, Credit Card etc.

Shipment Term

By sea, by air, by express, as customers request.

FAQ

Q1

What are the key properties that make Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets suitable for sputtering applications?

Answer: Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets are ideal for sputtering due to their high density, excellent thermal stability, and fine surface finish. These properties ensure uniform deposition, high sputtering rates, and durability, crucial for achieving high-quality thin films.

Q2

How does the fine surface of Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets affect its performance?

Answer: The fine surface of these tungsten targets promotes smoother and more uniform deposition. It reduces surface defects and irregularities, leading to improved film quality and adhesion. This fine surface finish is crucial for achieving precise and reliable results in sputtering processes.

Q3

Why is the high density of 19.15g/cm³ important for Tungsten Targets?

Answer: The high density of 19.15g/cm³ in Tungsten Targets is crucial for effective sputtering. It ensures a higher mass flux during the sputtering process, leading to faster deposition rates and thicker films. This high density also contributes to the targets' durability and resistance to erosion.

Q4

How does the chemical stability of tungsten contribute to the performance of Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets?

Answer: Tungsten's chemical stability ensures that the Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets maintain their performance even in harsh environments. Its resistance to corrosion and oxidation prevents degradation during sputtering, ensuring consistent and reliable film deposition.

Q5

What are the advantages of using Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets compared to other materials?

Answer: Metal Alloy Fine Surface 19.15g/cm³ Tungsten Targets offer several advantages over other materials. Their high density and thermal stability lead to faster deposition rates and improved film quality. The fine surface finish ensures uniform deposition, while tungsten's chemical stability ensures durability and long-term performance. These targets are also compatible with a wide range of sputtering systems and processes.