Titanium Silicide TiSi2 Powder,the Chinese name is titanium silicide (or titanium disilicate) powder, which is a chemical substance that appears gray-black and has an irregular microstructure. Titanium silicide has broad application prospects in the field of microelectronics due to its high conductivity, good thermal stability, good adsorption of Si, good process adaptability, and low interference with silicon connection parameters. It can also be used as a raw material powder for fine ceramics.

Titanium Silicide TiSi2 Powder

With the rapid development of microelectronics technology, the demand for high-performance and high-stability materials is increasing day by day. Recently, titanium silicide (TiSi2) powder has shown enormous potential in the field of microelectronics due to its excellent physical and chemical properties.Titanium silicide (TiSi2) is a compound with high thermal stability, high melting point (approximately 1540 ° C), and good conductivity. Its unique physical properties make it an indispensable material in microelectronic manufacturing. This material boasts a high level of purity and offers an adjustable average particle size meticulously controlled within the realm of nanometers up to micrometers, aligning seamlessly with the stringent precision standards mandated by the microelectronics manufacturing sector for its materials.Microelectronics: Titanium silicide (TiSi2) powder has broad application prospects in the field of microelectronics. It can be used as a contact material in microelectronic devices, effectively reducing device resistance and improving device performance and stability.Fine ceramic raw materials: In addition, titanium silicide (TiSi2) powder can also be used as a raw material powder for fine ceramics, providing excellent mechanical properties and thermal stability for ceramic products.With the continuous progress of microelectronics technology, the demand for high-performance materials will continue to grow. Titanium silicide (TiSi2) powder, as an important material in microelectronics manufacturing, has broad market prospects.

Titanium silicide powder used as raw material for fine ceramics

At present, multiple domestic and foreign enterprises and research institutions are actively investing in the research and production of titanium silicide (TiSi2) powder to meet market demand.In recent years, with the deepening of materials science research and technological progress, the preparation process and properties of titanium silicide (TiSi2) powder have been significantly improved. The emergence of new preparation methods not only improves the purity and uniformity of titanium silicide (TiSi2) powder but also reduces production costs, providing strong support for its application in the field of microelectronics.Titanium silicide (TiSi2) powder stands as a pivotal material within the realm of microelectronics, boasting extensive potential for application. Anticipating ongoing technological strides and a surge in market demands, the role of TiSi2 powder in the fabrication process of microelectronic devices is set to escalate, further solidifying its significance in shaping the future of this high-tech sector.

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Hot tags:semiconductor, semiconductor material

tags: semiconductor semiconductor material